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Selected Publications for Tyrone Vincent |
Journal articles:
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Estimation and System Identification - Theory and Applications
Kenneth Hsu, Carlo Novara, Tyrone Vincent, Mario Milanese, Kameshwar Poolla, “Parametric and Nonparametric Curve Fitting” Automatica Vol. 42 No. 11, pp. 1869-1873, 2006.
Matt J. Hilt, Tyrone L. Vincent, Bharat S. Joshi and Lin J. Simpson, “Estimating relative deposition rates in a multi-source continuous-deposition process using a single composition sensor,” IEEE Transactions on Control Systems Technology Vol. 14, No. 2, pp. 247-259, 2006.
M. Whitehorn, T. Vincent, C. H. Debrunner and J. Steele, “Stereo Vision in LHD Automation,” IEEE/IAS Transaction on Industry Applications, Vol. 39, No. 1, pp. 21 -29, 2003.
Lin Chai, William A. Hoff and Tyrone L. Vincent, “3-D motion and structure estimation using inertial sensors and computer vision for augmented reality,” Presence: Teleoperators and Virtual Environments, Vol. 11, No. 5, pp. 474-491, 2002.
Hoff, W. A. and T. L. Vincent, “Analysis of Head Pose Accuracy in Augmented Reality,” IEEE Trans. Visualization and Computer Graphics, Vol 6., No. 4, 2000.
T. L. Vincent and P. P. Khargonekar, “A Class of Nonlinear Filtering Problems arising from Drifting Sensor Gains,” IEEE Transactions on Automatic Control, vol. 44, no. 3, pp. 509-520, 1999.
C. Galarza, P. Khargonekar, N. Layadi, T. Vincent, E. Rietman and J. Lee, “A new algorithm for real-time thin film thickness estimation given in situ multiwavelength ellipsometry using an extended Kalman filter,” Thin Solid Films, pp. 313-314, February, 1998.
M. Sarfaty, C. Baum, R. Breun, N. Hershkowitz, J. L. Shohet, K. Nagpal, T. Vincent, P. P. Khargonekar, “Real-time measurement of thin film thickness during processing,” Plasmas and Polymers, vol. 2, no. 4, pp. 229-244, 1997.
T. L. Vincent, P. P. Khargonekar and F. L. Terry, Jr., “Real time estimation and feedback control of etch rate and etch depth using nonlinear filtering techniques,” Journal of the Electrochemical Society, vol. 144, no. 7, pp. 2467-2472, 1997.
T. L. Vincent, P. P. Khargonekar and F. L. Terry, Jr., “An Extended Kalman Filtering based method of processing reflectometry data for fast in-situ etch rate measurements,” IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 1, pp. 42-51, 1997.
Control of Materials Processing
Mark T. Lusk, Tyrone Vincent, and Moneesh Upmanyu, “Steering of a Grain Boundary with Strain, Electromagnetic Field, and Stochastic Boundary Excitation,” Journal of Applied Physics, Vol. 100, 103526, 2006.
Mark T. Lusk, Moneesh Upmanyu, and Tyrone Vincent, “Targeted manipulation of grain boundaries and triple junctions on thin films using lasers: A Potts model simulation,” Journal of Applied Physics, Vol. 99, 023505, 2006.
John P.H. Steele, Chris Mnich, Chris Debrunner, Tyrone Vincent, and Stephen Liu, “Development of closed-loop control of robotic welding processes,” Industrial Robot: An International Journal, Vol. 32, No. 4, pp. 350-355, 2005.
Tyrone L. Vincent and Laxminaryan L. Raja, “Optimal Pulse Shaping for Plasma Processing,” IEEE Transactions on Control Systems Technology, vol 12. no. 1, 2004.
Tyrone L. Vincent and Laxminaryan L. Raja, “A Novel Approach for Control of High-density Plasma Reactors through Optimal Pulse Shaping,” Journal of Vacuum Science and Technology A, Sept/Oct, 2002.
I.L. Eisgruber, B. Joshi, N. Gomez, J. Britt, T. Vincent, “In-situ x-ray fluorescence used for real-time control of CUINxGA1-x SE2 thin film composition”, Thin Solid Flims, vol. 408, pp. 64-72, 2002.
J. J. Robbins, R. T. Alexander, W. Xiao, T. L. Vincent and C. A. Wolden, “An investigation of tin oxide plasma-enhanced chemical vapor deposition using optical emission spectroscopy,” Thin Solid Films, vol. 406, pp. 145-150, 2002.
Joshua J. Robbins, Robert T. Alexander, Mailasu Bai, Yen-Jung Huang, Tyrone L. Vincent, and Colin A. Wolden, “Development of tin oxide synthesis by plasma-enhanced chemical vapor deposition”, Journal of Vacuum Science Technology A, Nov/Dec, 2001
M. Hankinson, T. Vincent, K. Irani, and P. Khargonekar, “Combined real-time and run-to-run control of etch depth and spatial uniformity in plasma etching,” Journal of the Electrochemical Society, vol. 144, no. 7, pp. 2473-2479, 1997.
M. Hankinson, T. Vincent, K. Irani, and P. Khargonekar, “Integrated real-time and run-to-run control of etch depth in reactive ion etching,” IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 1, pp. 121-130, 1997.